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NewsSep 8, 2026#Publication#Dry Electrode#CEJ

Taehyeong Kim and Wonjin Oh publish in Chemical Engineering Journal


First page of the article in Chemical Engineering Journal 545 (2026) 179740
First page of the article in Chemical Engineering Journal 545 (2026) 179740

A paper co-first-authored by Taehyeong Kim and Wonjin Oh (M.S. students, CAMP Lab) has been published in Elsevier’s Chemical Engineering Journal (2025 JCR IF 12.5, JCR Q1, top 3.6% in Engineering, Chemical). Congratulations to both.

Paper

  • Title: Disrupting the crack-delithiation feedback loop in dry-processed high-nickel cathodes through early-stage granule engineering
  • Journal: Chemical Engineering Journal 545 (2026) 179740 — Special issue “Emerging Functional Materials”
  • Authors: Taehyeong Kim‡, Wonjin Oh‡, Seokjun Kim, Chanho Lee, Jinhyung Kim, Minseok Kim, Jungmin Lee, Yunhee Jang, Minkyu Kim, Patrick Joohyun Kim, Taeseup Song, Ungyu Paik, Dongsoo Lee*, Junghyun Choi*, Seho Sun* (‡ equal contribution, * corresponding authors)
  • Collaborators: Gachon University, Kyungpook National University, Hanyang University
  • Available online: 21 July 2026
  • Link: https://doi.org/10.1016/j.cej.2026.179740
Graphical abstract: conventional dry process (CDP) versus pre-granulation process (PGP)
Graphical abstract: conventional dry process (CDP) versus pre-granulation process (PGP)

One-line conclusion

Forming a PTFE fibril network inside NCA granules before kneading lets the granules absorb and redistribute the stress of dry processing, which breaks the self-reinforcing loop between particle cracking and non-uniform delithiation.

The granule-induced dry electrode (GIDE) shows 77% lower charge-transfer resistance and 230% higher toughness than the conventional dry electrode (CDE), retains 86% of its capacity after 100 half-cell cycles at 10 mAh cm⁻² (the CDE fails at 60 cycles), and NCA‖graphite full cells retain 86.1% over 300 cycles. DFT and molecular dynamics support the mechanism: uniform delithiation preserves lattice ductility and lowers internal von Mises stress.